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Basic Service-Nanofabrication

exchangealt 中文
  • Update Date：2024-06-12
  • Units：Instrumentation Resource Center
Shallow Si RIE
Silicon shallow etching system
  • Shallow Si RIE
    Brand Model: Gigalane Maxis 200L
  • Instrument expert: Prof. Chen, Kuan-Neng
    ext 31558
    Email knchen@nycu.edu.tw
  • Equipment management personnel: Mr. Hu, Jack
    Extension 55607, 55666
    Email jackhu@nycu.edu.tw
  • Equipment management personnel: Mr. Lee, James
    Extension 55660, 55666
    Email cwlee@nycu.edu.tw
  • Instrument location: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus
  • ext 55616

Link to Nano Center Introduction Page

Instrument Information

  1. Brand Model: Gigalane Maxis 200L
  2. Purchase period: January 2022
  3. Place of placement: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
  4. Function: dry etching, high selectivity silicon shallow etching (Si/SiO2)
  5. Important Specifications: The gas used contains HBr, Cl2、CF4, Ar, O2, cooled by He gas system, mainly 4″ wafer
  6. The instrument can be used with special process material

 

Precautions
  1. Please specify the material of the base wafer, what kind of substances (such as SiO2, photoresist, etc.) are contained on it, and whether to remove the photoresist after etching (an additional Wet Bench application form is required).
  2. Front-end chips.
Do-it-yourself regulations
  1. Instructions for obtaining the permission to use the instrument:
  2. Instrument opening level and number of people.
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
  4. National Science Council Basic Research Core Facility Reservation ServiceManagement system (obtain serial number)
  5. Nano Center Instrument Reservation System(Reservation for use time slot)
Commissioning the operation of the instrument
  1. If there is a National Academy of Sciences, please come first National Science Council Basic Research Core Facility Reservation Service Manage system reservations and get the reservation number, then download RIE commissioned OEM application form, send the completed application form and materials tonanocenter(2F, solid-state electronic system building of our school) to assist the management personnel of each instrument in scheduling OEM.
  2. For those without a national science account, please download directly RIE commissioned OEM application form, send the completed application form and materials tonanocenter(2F, solid-state electronic system building of our school) to assist the management personnel of each instrument in scheduling OEM.
Charge information
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
  2. Payment method:
    • Do it yourself: charge a fee
    • Entrusted operation: charging usage fee + OEM fee
  3. Cost inquiry link
List of Instruments Basic Service-Nanofabrication Si Deep-RIE High Density Plasma Active Ion Etching System
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