[{"subject":"III-V Molecular Beam Epitaxy System","detailContent":"
\r\n
\"Group
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Instrument Information
\r\nChinese name: Group III and V Molecular Beam Epitaxy System
\r\nEnglish name: III-V Molecular Beam Epitaxy System
\r\nEnglish abbreviation: MBE
\r\nLabel: Veeco Modular GEN II solid source III-V MBE
\r\nInstrument Location: Room R110, 1st Floor, Solid-State Electronics Bldg., Guanfu Campus
\r\nPurchase Date: August 2004
\r\nDate of joining Guiyi: January 2015
\r\n
\r\nImportant Specifications
\r\n\r\n
    \r\n\t
  1. High Vacuum Growth chamber: Pressure < 5×10-10 torr
    2. \r\n\t
  2. Source Material: Ga, Al, In, As, Sb.
    3. \r\n\t
  3. Doping Source: Be, Si, Te
    4. \r\n\t
  4. Max substrate Size: 3 inches
    5. \r\n\t
  5. Epitaxy Layer thickness Variation < 5%
    6. \r\n\t
  6. The highest growth temperature: 640℃
    7. \r\n\t
  7. In-situ rsidual gas analysis (RGA) and reflection high energy electron diffraction (RHEED, 15kV):
    8. \r\n\t
  8. Regular monitoring epitaxy layer growth rate and quality.
    9. \r\n
\r\n
","page2Title":"Service Items and System Open Level","page2":"
\r\n
service items
\r\n\r\n
    \r\n\t
  1. This system is an ultra-high vacuum system. In principle, it is not open to operate by itself, but it can be accompanied on site.
    2. \r\n\t
  2. This system serves each wafer with 6 hours as a unit.
    3. \r\n\t
  3. The applicant user must contact the professor or technician in charge of the instrument to confirm that the sample meets the requirements.
    4. \r\n\t
  4. A maximum of 5 samples can be reserved per person at a time.
    5. \r\n\t
  5. Cancellation must be notified one week in advance.
    6. \r\n
\r\n\r\n

\r\nSystem open level
\r\nAt present, only the entrusted service is open, and it is operated by the technicians of this laboratory.
\r\n
","page3Title":"Charges","page3":"
\r\n
Opening hours:This machine adopts entrusted reservation. If you need to make an appointment, please go to your instrument system to make an appointment.
\r\n\r\n
\r\n\r\n\t\r\n\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\r\n
Charges
service itemsCharging standard (unit: NTD)
Arsenic sample commissionPlanning appointment: $4,000 /1µm
\r\n\t\t\tUnplanned appointment: $15,000 /1µm
Antimonide sample commissionPlanning appointment: $5,000 /1µm
\r\n\t\t\tUnplanned appointment: $25,000 /1µm
Special Structure Testing FeeAdditional correction fees ranging from 2-6µm will be charged according to the structural difficulty
Substrate costGaAs series: $7,000 / single chip
\r\n\t\t\tGaSb series: $25,000/single chip
\r\n\t\t\tInP series: $9,000 / single chip
\r\n
\r\n
\r\n\r\n
\r\n

\r\n   
\r\n\r\n
    \r\n\t
  1. The charging standard is calculated based on the sample growth thickness of 1 micron. The part exceeding 1 micron or more, if it is less than 1 micron, it will be calculated as 1 micron.
    2. \r\n\t
  2. In order to maintain the stability of the system and ultra-high vacuum conditions, the request of the entruster to provide substrates is not accepted; the unit will provide the crystal growth substrates uniformly.
    3. \r\n\t
  3. If you have other special requirements, please mail or call to discuss.
    4. \r\n\t
  4. For those who need long-term entrusted services, long-term project discounts can be provided.
    5. \r\n\t
  5. The unit can also assist in evaluating the feasibility of the structure and consulting services for growth proposals.
    6. \r\n
\r\n
","page4Title":"Test film restrictions and reservation method","page4":"
\r\n
Management methods and test strip restrictions
\r\n\r\n
    \r\n\t
  1. The substrates that can be grown are GaAs, InP, InAs, GaSb, and InSb.
    2. \r\n\t
  2. After submitting the appointment form, the entrusted operator must contact the technician to determine the experimental time and growth content.
    3. \r\n
\r\n\r\n

\r\nInstrument reservation method
\r\n\r\n
    \r\n\t
  1. LINK：https://vir.nstc.gov.tw/home/Index
    2. \r\n\t
  2. If you want to cancel the appointment, please contact the technician one week before and cancel online.
    3. \r\n\t
  3. Submit the appointment application form. Please take a photo or scan it and send it to the technician's mailbox
    4. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169160834551648256&init=Y","expFile":"Group III or Five Molecular Beam Epitaxy System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Laser Pattern Generator","detailContent":"
\r\n
\"Laser
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: HIMT DWL-200
    2. \r\n\t
  2. Purchase period: April 2007
    3. \r\n\t
  3. Location: Room 139, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616) 
    4. \r\n\t
  4. Function: Manufacture of glass photomasks (4", 5" and 6"), 5-inch quartz photomasks (contact)
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Laser light source 442nm(g-line) Helium _Cadmium LASER Power 125mW
      • \r\n\t\t
    • Minimum feature size is .80um
      • \r\n\t\t
    • Maximum effective area 200mm x 200mmdeposition)
      • \r\n\t\t
    • *.dxf file of GDSII and Auto CAD
      • \r\n\t\t
    • Dual CCD camera alignment system
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material.
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Mask Making Instructions
\r\n
","page3Title":"service items","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If you have an NSTC grant, please first make a reservation and obtain a reservation number through the NSTC Core Facilities for Basic Research Service Management System (https://vir.nstc.gov.tw/home/Index). Then, download DWL-200 OEM Application Form, and send the completed application form and materials to our center (2F, Solid State Electronic System Building of our school) for the instrument management personnel to assist in scheduling OEM.
    2. \r\n\t
  2. If you do not have an NSTC project, please download the DWL-200 OEM Application Form directly. Submit the completed application form and materials to our center (2F, Solid State Electronic System Building of our school) for the instrument management personnel to assist in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    3. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169168370554114048&init=Y","expFile":"Laser Pattern Generator"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=e990525c-7264-448e-ad41-ee81154b5695","relateName":"Pattern Generator"}]},{"subject":"Pattern Generator","detailContent":"
\r\n
\"Graphics
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
 Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Raith VOYAGER
    2. \r\n\t
  2. Purchase period: 2019
    3. \r\n\t
  3. Place of placement: Room 118, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55667)
    4. \r\n\t
  4. Function: thin film photoresist exposure and writing
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Exposure source: Electron Beam
      • \r\n\t\t
    • Maximum beam energy: 50kV
      • \r\n\t\t
    • Maximum write field: 500μm
      • \r\n\t\t
    • 50MHz Pattern Generator
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Positive list: the surface of the test piece is flat (thickness less than 1mm) (such as Si, SiC, GaAs, GaN and other materials)
    2. \r\n\t
  2. Negative table columns (prohibited):\r\n\t
      \r\n\t\t
    • Magnetic materials, powder materials, piezoelectric materials, synthetic photoresist
      • \r\n\t\t
    • low melting point material
      • \r\n\t\t
    • All materials that decompose or release gases and hinder the maintenance of vacuum when exposed to electron beams
      • \r\n\t
    \r\n\t
    3. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t
      \r\n\t\t
    1. Daytime permission application process description (Using permission is Monday to Friday 8:00~17:00)
      2. \r\n\t\t
    2. 24-hour application process description (You need to have daytime permission to apply)
      3. \r\n\t\t
    3. Precautions (Be sure to read carefully, so as not to lose your own rights)
      4. \r\n\t\t
    4. Graphics Generation System Operating Specifications & Exam record sheet
      5. \r\n\t
    \r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people, the relevant notes are as follows:\r\n\t
      \r\n\t\t
    1. In principle, the same laboratory is open to 3 people to operate by themselves, not limited to master and doctoral students (but doctoral students are preferred).
      2. \r\n\t\t
    2. Applicants who apply for self-operation of this equipment need to have experience in using nanocenter SEM instruments (the cumulative operating hours are at least 20 hours). knot book.
      3. \r\n\t\t
    3. 20 hours of accumulated hours of SEM operation must be attached.
      4. \r\n\t\t
    4. The number of training times for this equipment to operate by itself is 5 times.
      5. \r\n\t\t
    5. Those who are the trainers of this equipment must first obtain the 24-hour self-operating authority of this equipment.
      6. \r\n\t\t
    6. After passing the assessment, if the device has not been used for more than 3 months, its operating authority will be cancelled.
      7. \r\n\t
    \r\n\t
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t
      \r\n\t\t
    1. NSTC Basic Research Core Facility Reservation Service Management System (get serial number)
      2. \r\n\t\t
    2. Nano Center Instrument Reservation System (Use time slot reservation)
      3. \r\n\t
    \r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System(https://vir.nstc.gov.tw/home/Index) Make an appointment and get the appointment number, then download OEM Application Form for Graphical Generation System, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without a national science account, please download directly OEM Application Form for Graphical Generation System, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. The user prepares the chip.
    3. \r\n\t
  3. When NFC photoresist is required for the entrusted graphic exposure and writing, the entrusted coating material fee is 800 yuan (within 2 pieces of fragments or 1 piece of 4 inches, cash charge).
    4. \r\n\t
  4. The exposure and writing of the mask depend on the pattern and will be quoted separately after evaluation.
    5. \r\n\t
  5. Payment method:\r\n\t
      \r\n\t\t
    • Self-operation: charge usage fee
      • \r\n\t\t
    • Entrusted operation: charge usage fee + OEM fee
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    7. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169163857558507520&init=Y","expFile":"Graphics Generation System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=9b3d4c4f-6606-4496-9bbc-b1d1bb2ca075","relateName":"Laser Pattern Generator"}]},{"subject":"Double Side Mask Aligner (A)","detailContent":"
\r\n
\"Mask
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: Keyi Technology AG1000-4D-DSMV
    2. \r\n\t
  2. Purchase period: November 2011 
    3. \r\n\t
  3. Place of placement: Room 137, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
    4. \r\n\t
  4. Function: Alignment exposure of various components
    5. \r\n\t
  5. Important Specifications:\r\n\t
      \r\n\t\t
    • Mask holder: 4″x4″ , 5″x5″
      • \r\n\t\t
    • Chuck: 4″
      • \r\n\t\t
    • Exposure size: 4″
      • \r\n\t\t
    • Light source: 1000W
      • \r\n\t\t
    • Mercury light source: NUV
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Reservations are made in one hour.
    2. \r\n\t
  2. The process reservation time of users with this equipment is at most one time slot per day, and repeated reservations are not allowed
    3. \r\n\t
  3. Reservation Cancellation: Those who cannot operate the equipment within the reservation period due to emergencies should cancel the reservation registration 24 hours before the reservation. Those who do not cancel will be charged according to the original period, and the original period must be opened by the equipment management personnel. For other users to operate and use it, the original reservation user shall be punished, and the punishment shall be determined separately.
    4. \r\n\t
  4. Those who do not arrive on time for the appointment registration will be deemed to have not picked up the appointment, and the time slot can be used by other users.
    5. \r\n\t
  5. For commissioned producers, please contact the equipment management personnel first.
    \r\n\t 
    6. \r\n
\r\n
","page3Title":"Self-operation Regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. To apply for this machine, an additional test is required at the same timePhotoresist Coater,vacuum oven,Optical microscope
    2. \r\n\t
  2. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    3. \r\n\t
  3. Instrument opening level and number of people.
    4. \r\n\t
  4. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    5. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If non-standard silicon wafers or other materials must be distinguished from the front and back, the front and back sides and the surface to be processed must be marked on the application form or on the wafer. Those who do not mark or do not provide confirmation information will not be accepted.
    2. \r\n\t
  2. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index) Make an appointment and get the appointment number, then download OEM Application Form for Double-sided Mask Alignment Exposure Machine, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n\t
  3. For those without an NSTC project, please download the OEM Application Form for Double-sided Mask Alignment Exposure Machine directly. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    4. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Photoresist only: NTD $500 per piece (4″ and fragments are charged the same).
    3. \r\n\t
  3. When the OEM requires the second alignment (the applicant must be present and accompanied to facilitate confirmation of the alignment position and avoid disputes).
    4. \r\n\t
  4. If you do it yourself, your fee will be charged. If you entrust an agent, you will be charged both the labor fee and your fee (both).
    5. \r\n\t
  5. charging method\r\n\t
      \r\n\t\t
    • Operate by yourself:Charge usage fee
      • \r\n\t\t
    • Delegated operation:Charge usage fee+ OEM fee
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    7. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169181871339212800&init=Y","expFile":"Mask Alignment Exposure Machine (A)"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=17362319-e858-48e7-a167-545b21005ed1","relateName":"Double Side Mask Aligner (B)"}]},{"subject":"Double Side Mask Aligner (B)","detailContent":"
\r\n
\"Mask
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Keyi Technology AG1000-6N-ST
    2. \r\n\t
  2. Purchase period: November 2019 
    3. \r\n\t
  3. Place of placement: Room 137, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
    4. \r\n\t
  4. Function: Alignment exposure of various components
    5. \r\n\t
  5. Important Specifications:\r\n\t
      \r\n\t\t
    1. Mask holder: 4″x4″ , 5″x5″
      2. \r\n\t\t
    2. Chuck: 4″
      3. \r\n\t\t
    3. Exposure size: 4″
      4. \r\n\t\t
    4. Light source: 1000W
      5. \r\n\t\t
    5. Mercury light source: NUV
      6. \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Reservations are made in one hour.
    2. \r\n\t
  2. The process reservation time of users with this equipment is at most one time slot per day, and repeated reservations are not allowed
    3. \r\n\t
  3. Reservation Cancellation: Those who cannot operate the equipment within the reservation period due to emergencies should cancel the reservation registration 24 hours before the reservation. Those who do not cancel will be charged according to the original period, and the original period must be opened by the equipment management personnel. For other users to operate and use it, the original reservation user shall be punished, and the punishment shall be determined separately.
    4. \r\n\t
  4. Those who do not arrive on time for the appointment registration will be deemed to have not picked up the appointment, and the time slot can be used by other users.
    5. \r\n\t
  5. For commissioned producers, please contact the equipment management personnel first.
    6. \r\n
\r\n
","page3Title":"Self-operation Rregulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. To apply for this machine, an additional test is required at the same time Photoresist Coater,vacuum oven,Optical microscope
    2. \r\n\t
  2. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    3. \r\n\t
  3. Instrument opening level and number of people.
    4. \r\n\t
  4. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    5. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If non-standard silicon wafers or other materials must be distinguished from the front and back, the front and back sides and the surface to be processed must be marked on the application form or on the wafer. Those who do not mark or do not provide confirmation information will not be accepted.
    2. \r\n\t
  2. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index) Make an appointment and get the appointment number, then download OEM Application Form for Double-sided Mask Alignment Exposure Machine, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n\t
  3. For those without a national science account, please download the OEM Application Form for Double-sided Mask Alignment Exposure Machine directly. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    4. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Photoresist only: NTD $500 per piece (4″ and fragments are charged the same).
    3. \r\n\t
  3. When the OEM requires the second alignment (the applicant must be present and accompanied to facilitate confirmation of the alignment position and avoid disputes).
    4. \r\n\t
  4. Payment method:\r\n\t
      \r\n\t\t
    • Operate by yourself:Charge usage fee
      • \r\n\t\t
    • Delegated operation:Charge usage fee+ OEM fee
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    6. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169176819430068224&init=Y","expFile":"Mask Alignment Exposure Machine (B)"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=c65bd2f5-03e0-40b3-999a-68a335d959fb","relateName":"Double Side Mask Aligner (A)"}]},{"subject":"Oxidative & Diffusion Furnaces","detailContent":"
\r\n
\"Oxidative
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: Senji SJ-CA1200-D4
    2. \r\n\t
  2. Purchase period: December 2012
    3. \r\n\t
  3. Location: Room 121, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)   
    4. \r\n\t
  4. Function:\r\n\t
      \r\n\t\t
    •  Wet oxygen oxidation, dry oxygen oxidation (dry & wet oxidation)
      • \r\n\t\t
    • N-type, P-type wafer (annealed)
      • \r\n\t\t
    • SiO2 /Si，High-K /Si.Ge (Sintering)
      • \r\n\t\t
    • Al annealing
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • The maximum heating temperature is 1100°C
      • \r\n\t\t
    • The length of the heating zone is 900mm, and the diameter of the furnace tube is 6″
      • \r\n\t\t
    • Constant temperature zone 600mm ±1°C at 1000°C (three-point measurement)
      • \r\n\t\t
    • 0~1100°C heating time for 2 hours
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Need to have Wet Bench Only use permission can apply for the use of the oxidation diffusion system.
    2. \r\n\t
  2. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    3. \r\n\t
  3. Instrument opening level and number of people.
    4. \r\n\t
  4. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    5. \r\n\t
  5. Management and usage:\r\n\t
      \r\n\t\t
    • The furnace tube is reserved for use in four hours as a section, and the applicable furnace tubes are Wet Oxidation, P+ Annealing, N+ Annealing, Dry Oxidation and other furnace tubes.
      • \r\n\t\t
    • Each furnace tube has a maximum of three sections (three sections) for the reserved process use time, and the same furnace tube is reserved for a maximum of two (including two) process use times within a week.
      • \r\n\t\t
    • Reservation method: You can make reservations for the current week and the next week together every week.
      • \r\n\t\t
    • If the reservation is cancelled due to an unexpected situation, which makes it impossible to operate the equipment within the reservation period, the reservation registration should be cancelled three hours before the reservation. Other users operate and use it.
      • \r\n\t\t
    • Those who fail to show up for more than 30 minutes will be deemed to have cancelled the reservation, and the time slot can be used by other users.
      • \r\n\t\t
    • After the experiment is completed, the use record book should be filled out. 
      • \r\n\t
    \r\n\t
    6. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Delegate to operate the instrument:
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index) Make an appointment and get the appointment number, then download Oxidation Diffusion System OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the Oxidation Diffusion System OEM Application Form directly. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. This center stipulates that the maximum temperature is 1100oC, for 3″ and 4″ wafers, with a maximum of 25 wafers at a time.
    3. \r\n\t
  3. Parts of an hour are counted as one hour.
    4. \r\n\t
  4. The wafer entering the furnace tube must be cleaned first. Please refer to the cleaning fee for details. Wet_Bench Fee Schedule.
    5. \r\n\t
  5. Payment method:\r\n\t
      \r\n\t\t
    • Self-operation: charge start-up fee + production fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + production fee + OEM fee
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    7. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169172716977131520&init=Y","expFile":"Oxidative Diffusion System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Low Pressure Chemical Vapor Deposition System","detailContent":"
\r\n
\"Low
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: SJ-10301001-1
    2. \r\n\t
  2. Purchase period: December 28, 2014
    3. \r\n\t
  3. Place of placement: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616) 
    4. \r\n\t
  4. Function:\r\n\t
      \r\n\t\t
    • (1).Chamber: 6″, the length of the uniform temperature zone is 600mm
      • \r\n\t\t
    • (2). Vacuum: 5*10-3 Torr
      • \r\n\t\t
    • (3). Temperature: POLY-Si-620°C, Si3N4-800°C, TEOS-700°C
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • (1).Poly-Si in-situ phosphine (Poly-Si in-situ PH3): Temperature: 585°C Gas: SiH4, PH3 Pressure: 500mtorr
      • \r\n\t\t
    • (2). Polycrystalline silicon and amorphous silicon deposition (poly-Si & amorphous-Si), silicon germanium deposition (SiGe): temperature: 620°C/550°C gas: SiH4, GeH4 pressure: 300mtorr
      • \r\n\t\t
    • (3). Deposition of Silicon Nitride (Si3N4): Temperature: 800°C/850°C Gas: SiH2Cl2, NH3 Pressure: 120mtorr
      • \r\n\t\t
    • (4). Deposition of TEOS: Temperature: 700°C Gas: TEOS Pressure: 120mtorr
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Need to haveWet BenchOnly use permission can apply to use the LPCVD system.
    2. \r\n\t
  2. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    3. \r\n\t
  3. Instrument opening level and number of people.
    4. \r\n\t
  4. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    5. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index) Make an appointment and get the appointment number, then download LPCVD OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the LPCVD OEM Application Form directly, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. charging method\r\n\t
      \r\n\t\t
    • Self-operation: charge start-up fee + production fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + production fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168722692765913088&init=Y","expFile":"Low pressure chemical vapor deposition system"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Plasma-Enhanced Chemical Vapor Deposition (PECVD)","detailContent":"
\r\n
\"Plasma
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Samco
    2. \r\n\t
  2. Year of purchase: July 1998
    3. \r\n\t
  3. Place of placement: Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666) 
    4. \r\n\t
  4. Function: grow thin films such as SiO2 and Si3N4
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Usable wafer size: Fragment to 4 inches
      • \r\n\t\t
    • Single cavity: Chamber temperature 300°C
      • \r\n\t\t
    • The gases used include: N2O, NH3, CF4, SiH4+Ar, N2, etc., which can provide low temperature film deposition of SiO2 and Si3N4
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System  (https://vir.nstc.gov.tw/home/Index)Make an appointment and get the appointment number, then download PECVD OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the PECVD OEM Application Form directly, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. charging method\r\n\t
      \r\n\t\t
    • Self-operation: charge start-up fee + production fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + production fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168726640084127744&init=Y","expFile":"Plasma Assisted Chemical Vapor Deposition System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Dielectric Active Ion Etching System A","detailContent":"
\r\n
\"Dielectric
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: RIE-400iP manufactured by SamCo Corporation of Japan.
    2. \r\n\t
  2. Purchase period: March 4, 2019.
    3. \r\n\t
  3. Location: Laboratory 121, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55610).   
    4. \r\n\t
  4. Function: dry etching, mainly etching silicon carbide (SiC), and can etch dielectric (SiO2, Si3N4) material, 4″ wafer-based.
    5. \r\n\t
  5. Important specifications: This etching system can be fed with C4F8, O2, SF6, CHF3 and other gases to etch silicon carbide (SiC) and dielectric (SiO2, Si3N4).
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Material Restrictions:\r\n\t
      \r\n\t\t
    • (1) Limited to silicon carbide (SiC) substrates and Si substrates.
      • \r\n\t\t
    • (2). The test piece shall not be doped with metal elements or plated with metal films.
      • \r\n\t\t
    • (3). The test piece shall not pass through the post-processing machine.
      • \r\n\t
    \r\n\t
    2. \r\n\t
  2. Please explain in detail what substances are on the substrate (such as Poly-Si, SiO2, Si3N4, photoresist, etc.), and whether to clean the wafer.
    3. \r\n\t
  3. If there is no special requirement for etching, it will be done according to the standard process parameters of the center.
    4. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index)Make an appointment and get the appointment number, then download RIE-400iP OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download directly RIE-400iP OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling the RIE-400iP OEM Application Form directlyOEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. charging method\r\n\t
      \r\n\t\t
    • Do it yourself: charge a fee
      • \r\n\t\t
    • Entrusted operation: charging usage fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page6Title":"References","page6":"
\r\n
2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video
\r\n
","page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168734453216841728&init=Y","expFile":"Dielectric Active Ion Etching System A"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=09960a93-175f-47a7-ae1f-082eec10162b","relateName":"Dielectric Materials Reactive Ion Etching System B"}]},{"subject":"Dielectric Materials Reactive Ion Etching System B","detailContent":"
\r\n
\"REACTIVE
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-20","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: RIE200L made by SamCo, Japan
    2. \r\n\t
  2. Purchase period: December 1, 2002
    3. \r\n\t
  3. Place of placement:Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666)
    4. \r\n\t
  4. Function: etching silicon dioxide, silicon nitride and other materials
    5. \r\n\t
  5. Important Specifications: The RF generator can output a maximum of 300W and a frequency of 13.56MHz. The etching system can enter CF4, O2, SF6, CHF3 and other gases to etch materials such as silicon dioxide and silicon nitride.
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Please explain in detail what substances are contained on the substrate (such as SiO2, Si3N4, Metal, photoresist, etc.).
    2. \r\n\t
  2. If there are no special requirements for etching, it will be done according to the central standard process:\r\n\t
      \r\n\t\t
    • SiOx : (RIE mode) 300 ~400 Å/min 100W,4Pa.
      • \r\n\t\t
    • SiNx : (RIE mode) 900~1000 Å/min 100W,4Pa.
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. The wafer shall not contain Ag, Au, Cu, Fe, Ni, Zn, LiNbO3, In, Pb, Sn, ITO and other components.
    4. \r\n\t
  4. Metal must not be exposed.
    5. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is a National Academy of Sciences, please come first to NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the RIE 200L OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the RIE 200L OEM Application Form directly, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. charging method\r\n\t
      \r\n\t\t
    • Do it yourself: charge a fee
      • \r\n\t\t
    • Entrusted operation: charging usage fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page6Title":"References","page6":"
\r\n
2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video
\r\n
","page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168731341475287040&init=Y","expFile":"REACTIVE ION ETCHING SYSTEM FOR DIELECTRIC MATERIALS B"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=cbb45d9b-627f-4b3f-8d7d-f51c4c51ee6a","relateName":"Dielectric Active Ion Etching System A"}]},{"subject":"Cold Field Emission Scanning Electron Microscope & Energy Dispersive","detailContent":"
\r\n
\"Cold
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Fazility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Hitachi SU-8010
    2. \r\n\t
  2. Purchase period: October 2013
    3. \r\n\t
  3. Place of placement: Laboratory, Room 212, 2nd Floor, Engineering Building 6, Guanfu Campus (TEL: 55337) 
    4. \r\n\t
  4. Function:\r\n\t
      \r\n\t\t
    • Electron Microscope Observation (SEM): High-magnification magnification to observe the microstructure or cross-sectional structure of components, films, etc.
      • \r\n\t\t
    • Surface energy level analysis (EDS): electron energy level spectrum analysis of surface material composition at a specific location to determine the composition of surface material or pollution
      • \r\n\t\t
    • Pre-treatment of test piece: newly purchased ion mill, with section grinding & surface grinding function, to help make the surface of the test piece smoother and facilitate SEM observation
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Electron source: cold cathode electron gun
      • \r\n\t\t
    • Operating voltage: 0.1kV~30kV
      • \r\n\t\t
    • Specimen size: 50mm diameter x 50mm diameter
      • \r\n\t\t
    • Resolution: 10A° (at 15kV) or 13A° (at 1kV)
      • \r\n\t\t
    • The magnification is 20 times to 800,000 times (depending on the test piece itself)
      • \r\n\t\t
    • Secondary electron resolution 1.0nm (under 15kV)
      • \r\n\t\t
    • EDS can provide full spectrum qualitative analysis (Be4~U92), semi-quantitative analysis and element distribution map
      • \r\n\t\t
    • Gas used in the ion mill: Argon (Ar)
      • \r\n\t\t
    • Profile grinding range X: ≥ 7mm Y: ≥ 3mm
      • \r\n\t\t
    • Surface grinding speed: 0°: ≥2μm/hr 60°: ≥20μm/hr
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Materials restricted by SEM
\r\n\r\n
    \r\n\t
  1. Magnetic materials (including iron, cobalt, nickel components)
    2. \r\n\t
  2. Organics, polymers, powders and other materials
    3. \r\n\t
  3. All materials that decompose or release highly volatile substances or gases upon exposure to electron beams
    4. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
self-operated instrument\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    3. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index).  Make an appointment and get the reservation number, then download the SEM8010 OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the SEM8010 OEM Application Form directly. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Please bring your own conductive tape or thermal paper (K65HM).
    3. \r\n\t
  3. charging method\r\n\t
      \r\n\t\t
    • Self-operation: Set-up fee is charged (excluding sample surface coating/EDS)
      • \r\n\t\t
    • Entrusted operation: start-up fee + OEM fee (excluding sample surface coating/EDS)
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    5. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168742033137864704&init=Y","expFile":"Cold Field Emission Scanning Electron Microscope and Energy Dispersion Analysis Instrument"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Dual beam [focused ion beam & electron beam] System (FIB)","detailContent":"
\r\n
\"DUAL
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
 Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: TESCAN GAIA3
    2. \r\n\t
  2. Purchase period: December 18, 2017
    3. \r\n\t
  3. Place of placement: Room 213, Engineering Sixth Building, Guanfu Campus (TEL: 55368) 
    4. \r\n\t
  4. Function:\r\n\t
      \r\n\t\t
    • Preparation of in-situ and ex-situ TEM specimens for transmission electron microscopy
      • \r\n\t\t
    • Nanostructure manufacturing process: manufacturing process and observation of specific pattern structure of nanomaterials and components
      • \r\n\t\t
    • Production and observation of cross-sectional test pieces: cutting and image recording of cross-sectional test pieces
      • \r\n\t\t
    • Platinum deposition: platinum coating and image recording
      • \r\n\t\t
    • Observation and analysis of abnormality in the process: circuit repair, cutting, coating and image recording of solid-state electronic components
      • \r\n\t\t
    • Crystal phase analysis and observation
      • \r\n\t\t
    • The machine is equipped with energy dispersive mass spectrometer (EDX), which can be used for qualitative and semi-quantitative analysis of elemental components
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Electron source: field emission type
      • \r\n\t\t
    • Ion source: Ga liquid metal ion source
      • \r\n\t\t
    • Accelerating voltage: electron beam—200V~30kV, ion beam—
      • \r\n\t\t
    • 500V~30kV
      • \r\n\t\t
    • Image resolution: SEM—1.5nm at 15kV, FIB—2.5nm at 30kV
      • \r\n\t\t
    • Working distance: 5mm
      • \r\n\t\t
    • Specimen specification: diameter (10mm dia ) x height (<0.50cm)
      • \r\n\t\t
    • Magnification SEM: 4x~1Mx, FIB: 150x~1Mx
      • \r\n\t\t
    • GIS, Pt, SiO2
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Restricted use of FIB machine materials:\r\n\t
      \r\n\t\t
    • Magnetic materials
      • \r\n\t\t
    • All powder and other electron beams will decompose or release gaseous materials
      • \r\n\t\t
    • Substances with low melting point
      • \r\n\t\t
    • The alloy material contains magnetic material higher than 5%
      • \r\n\t
    \r\n\t
    2. \r\n\t
  2. The user must explain the production method of the test piece in detail. If the vacuum chamber may be polluted, the unit has the right to refuse to accept it. Those who make an appointment should fill in the application form three days before the experiment (please draw the top view and cross-section of the sample and the observation position, and indicate the material and thickness of each layer), and send the file to the technical staff for review.
    3. \r\n\t
  3. If the machine is damaged or polluted due to improper handling of the test piece, it shall be liable for compensation. The compensation fee is evaluated by the original factory and implemented after the decision of the management committee.
    4. \r\n\t
  4. The diameter of the test piece is about 10mm dia, and the height is less than 0.5cm. If it is a special size, please contact the administrator in advance to confirm whether it is suitable for the experiment.
    5. \r\n\t
  5. Semiconductor, poor conductivity and insulator test pieces need to be coated with a conductive film (gold or platinum is preferred), and no coating treatment is provided on site.
    6. \r\n\t
  6. Please bring your own blank disc to access the data. In order to avoid equipment poisoning, disable the USB flash drive for image file transfer.
    7. \r\n\t
  7. Please prepare your own copper mesh for TEM test piece production. One piece is produced every 3 hours, and the client and the teaching assistant work together to place the test piece on the self-provided copper grid using OM. Because the material of the test piece will affect the adsorption effect of the glass needle, if the copper mesh is not successfully placed, it will not be supplemented.
    8. \r\n\t
  8. Other payment instructions:\r\n\t
      \r\n\t\t
    • Platinum electrode payment: no charge for platinum electrode plating time within 0.1%. The pricing method of more than 0.1% is 200 yuan in cash per 0.1%. Please take the payment note to the Nano Center for payment after the experiment
      • \r\n\t\t
    • EDX payment: The EDX of this machine can be used for Mapping / Line Scan / qualitative and semi-quantitative analysis, with an additional charge of 600 yuan per hour.
      • \r\n\t
    \r\n\t
    9. \r\n\t
  9. If the sample is found to be non-compliant during the analysis and testing, the sample will be returned and paid for the time slot of its appointment. Please send the experimental samples for testing. The user should be present to explain the content to be analyzed.
    10. \r\n\t
  10. The reservation limit of your instrument system is: each program host can only make two reservations per month. The machine opening appointment time is 9:00 am on the 25th of each month, and the next month's experiment will be reserved. If you need to cancel the experiment time after the appointment, please log in to your system five days before to cancel, otherwise you will still need to deduct.
    11. \r\n\t
  11. Self-operation: From 9:00 a.m. on the 25th of each month, make an appointment for the experiment from the 1st to the 15th of the next month; from 9:00 a.m. on the 10th of the current month, make an appointment for the experiment from the 16th to the end of the month, each person is limited to one appointment per echelon. The reservation needs to be canceled 2 days before: If the cancellation is not made 2 days before, the payment will not be deducted; And if no one can use it as a substitute during this period, a fee will be charged.
    12. \r\n\t
  12. If you fail to make an appointment without a reason, the time slot will be automatically deducted; if you are more than 15 minutes late, the appointment time slot will be deducted and the service will be cancelled.
    13. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please come to the NSTC Basic Research Core Facility Reservation Service management system (https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the FIB OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the FIB OEM Application Form. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Please bring your own blank CD
    3. \r\n\t
  3. Cash charges for consumables (NT$500 per test strip cleaning)
    4. \r\n\t
  4. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    5. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168746622876651520&init=Y","expFile":"DUAL BEAM [FOCUSED ION BEAM & ELECTRON BEAM] SYSTEM"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"High Density Plasma Active Ion Etching System","detailContent":"
\r\n
\"High
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: SAMCO – RIE-10N
    2. \r\n\t
  2. Purchase period: March 1999
    3. \r\n\t
  3. Place of placement: Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666) 
    4. \r\n\t
  4. Function: dry etching, mainly etching Al material
    5. \r\n\t
  5. IMPORTANT SPECIFICATIONS: Use Gas Contains BCl3, Cl2、CF4、CHF3, Ar, O2, SF6, ICP RF maximum power 900W, Bias RF maximum power 300W, cooled by He gas system, mainly 4″ wafer
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Please specify the material of the substrate wafer, what kind of substance is contained on it (such as SiO2, photoresist, etc.) and whether to clean the wafer.
    2. \r\n\t
  2. If there is no special requirement for etching, it will be done according to the central standard process.
    3. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make a reservation and get the reservation number, then download the HDP-RIE OEM Application Form. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the HDP-RIE OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. charging method\r\n\t
      \r\n\t\t
    • Do it yourself: charge a fee
      • \r\n\t\t
    • Entrusted operation: charging usage fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page6Title":"References","page6":"
\r\n
2022 Yangming Jiaotong University Instrument Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video
\r\n
","page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168760241987260416&init=Y","expFile":"High Density Active Ion Etching System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=b0eb6b98-f5d6-41d5-84c6-cc35e6ce12a9","relateName":"Shallow Si RIE"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=808d86c1-e68b-4c05-93cd-0a4b85ed637b","relateName":"Si Deep-RIE"}]},{"subject":"Si Deep-RIE","detailContent":"
\r\n
\"Silicon
\r\n\r\n
\r\n\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Oxford Estrelas 100
    2. \r\n\t
  2. Purchase period: December 2016
    3. \r\n\t
  3. Place of placement: Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666)
    4. \r\n\t
  4. Function: dry etching, mainly silicon deep etching (Bosch Process)
    5. \r\n\t
  5. Important specifications: The gas used includes C4F8, SF6, CHF3, CF4, Ar, O2, cooled by He gas system, mainly 4″ wafer
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Please specify the material of the substrate wafer, what kind of substances (such as SiO2, photoresist, etc.) are contained on it, and whether to remove the photoresist after etching (an additional Wet Bench application form is required).
    2. \r\n\t
  2. Silicon deep etching sample preparation please follow Test piece regulations.
    3. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and get the reservation number, then download Si Deep-RIE OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the Si Deep-RIE OEM Application Form, and submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Payment method:\r\n\t
      \r\n\t\t
    • Do it yourself: charge a fee
      • \r\n\t\t
    • Entrusted operation: charging usage fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page6Title":"References","page6":"
\r\n
2022 NYCU Instrumentation Resource Center Basic Research Core Facilities Online Technology Sharing Conference Video
\r\n
","page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168759059810095104&init=Y","expFile":"Silicon Deep Etch System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=b0eb6b98-f5d6-41d5-84c6-cc35e6ce12a9","relateName":"Shallow Si RIE"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=27dd564a-8602-4dbb-8056-22d5c1c20815","relateName":"High Density Plasma Active Ion Etching System"}]},{"subject":"Shallow Si RIE","detailContent":"
\r\n
\"Silicon
\r\n\r\n
\r\n
\r\n
    \r\n\t
  • Shallow Si RIE
    \r\n\tBrand Model: Gigalane Maxis 200L
    • \r\n\t
  • Instrument expert: Prof. Chen, Kuan-Neng
    \r\n\t03-5712121 ext 31558
    \r\n\tEmail knchen@nycu.edu.tw
    • \r\n\t
  • Equipment management personnel: Mr. Hu, Jack
    \r\n\t03-5712121 ext 55607, 55666
    \r\n\tEmail jackhu@nycu.edu.tw
    • \r\n\t
  • Equipment management personnel: Mr. Lee, James
    \r\n\t03-5712121 ext 55660, 55666
    \r\n\tEmail cwlee@nycu.edu.tw
    • \r\n\t
  • Instrument location: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus
    • \r\n
\r\n
\r\n
\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"

Nano Facility Center
\r\n
\r\nInstrument Information

\r\n\r\n
    \r\n\t
  1. Brand Model: Gigalane Maxis 200L
    2. \r\n\t
  2. Purchase period: January 2022
    3. \r\n\t
  3. Place of placement: Laboratory 127, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
    4. \r\n\t
  4. Function: dry etching, high selectivity silicon shallow etching (Si/SiO2)
    5. \r\n\t
  5. Important Specifications: The gas used contains HBr, Cl2、CF4, Ar, O2, cooled by He gas system, mainly 4″ wafer
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n\r\n

 

","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Please specify the material of the base wafer, what kind of substances (such as SiO2, photoresist, etc.) are contained on it, and whether to remove the photoresist after etching (an additional Wet Bench application form is required).
    2. \r\n\t
  2. Front-end chips.
    3. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
Do-it-yourself regulations
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
    4. \r\n\t
  4. NSTC Basic Research Core Facility Reservation Service Management system (obtain serial number)
    5. \r\n\t
  5. Nano Center Instrument Reservation System(Reservation for use time slot)
    6. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and obtain the reservation number, then download the RIE-commissioned OEM application form. Submit the completed application form and materials to the Nano Facility Center(2F, solid-state electronic system building of our school) to assist the management personnel of each instrument in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the RIE-commissioned OEM application form. Submit the completed application form and materials to the Nano Facility Center(2F, solid-state electronic system building of our school) to assist the management personnel of each instrument in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Payment method:\r\n\t
      \r\n\t\t
    • Do it yourself: charge a fee
      • \r\n\t\t
    • Entrusted operation: charging usage fee + OEM fee
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    4. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1168750751141335040&init=Y","expFile":"Silicon shallow etching system"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=808d86c1-e68b-4c05-93cd-0a4b85ed637b","relateName":"Si Deep-RIE"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=27dd564a-8602-4dbb-8056-22d5c1c20815","relateName":"High Density Plasma Active Ion Etching System"}]},{"subject":"Thermal Evaporation Coater","detailContent":"
\r\n
\"Thermal
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Japan ULVAC EBX-6D
    2. \r\n\t
  2. Purchase period: January 1995
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608) 
    4. \r\n\t
  4. Function: thin film evaporation (mainly used for the evaporation of aluminum metal)
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Pumping system: RP+ diffusion pump, minimum pressure 2.0E–6 Torr
      • \r\n\t\t
    • Substrate size: 8 4-inch wafers or 5 6-inch wafers
      • \r\n\t\t
    • Coating uniformity: within ±5% (4-inch substrate)
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and get the reservation number, then download the Thermal Coater OEM Application Form. Submit the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the Thermal Coater OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Material cost is extra (according to the different needs of coating thickness and material) 4 inches 8 pieces, 6 inches 5 pieces.
    3. \r\n\t
  3. Contaminating materials such as copper (Cu) and gold (Au) cannot be plated.
    4. \r\n\t
  4. Payment method:\r\n\t
      \r\n\t\t
    • Self-operated: Start-up fee + material fee charged
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + foundry fee
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    6. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169150978331512832&init=Y","expFile":"Thermal Resistance Wire Evaporation System"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=633ba148-e25a-4e1e-9249-456a337fa857","relateName":"Dual E-Gun Evaporation System B"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=d03012fb-5857-45ef-bdbf-7359e9ae8e56","relateName":"Dual E-Gun Evaporation System A"}]},{"subject":"Dual E-Gun Evaporation System A","detailContent":"
\r\n
\"Double
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: Japan ULVAC EBX-10C
    2. \r\n\t
  2. Year of purchase: May 1993
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608) 
    4. \r\n\t
  4. Function: Can be used for multi-layer thin film evaporation (limited to materials commonly used in semiconductor processes)
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • EB gun Model EGK-3M*2.5kw EB power 2 units
      • \r\n\t\t
    • Pumping system: RP + Cryo pump U-10 pu (2300 L/SN2), minimum pressure 2*10¯6Torr
      • \r\n\t\t
    • Substrate size: 18 4-inch wafers or 3 6-inch wafers + 6 4-inch wafers
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and get the reservation number, then download the E-Gun (A) OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the E-Gun (A) OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. The Material fee is extra\r\n\t
      \r\n\t\t
    • A full load can hold 18 4-inch or 3-inch wafers, or 3 6-inch wafers plus 6 4-inch or 3-inch wafers.
      • \r\n\t\t
    • Bring your own Pt. Please prepare particles with a purity of 99.99%. A new 3cc graphite crucible suitable for ULVAC machines should be filled at least 90% full. For those who prepare their own materials, the center will not be responsible for any loss of crucibles and materials caused by the operation process.
      • \r\n\t\t
    • The maximum thickness of Pt per RUN is 50nm.
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Payment method:\r\n\t
      \r\n\t\t
    • Self-operated: Start-up fee + material fee charged
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + foundry fee
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    5. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169151894468169728&init=Y","expFile":"Double electron gun evaporation system A"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=39b8b95d-349e-4703-8911-6d780a18ede3","relateName":"Thermal Evaporation Coater"}]},{"subject":"Dual E-Gun Evaporation System B","detailContent":"
\r\n
\"Dual
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
 Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: Japan ULVAC EBX-10C
    2. \r\n\t
  2. Year of purchase: May 1993
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608) 
    4. \r\n\t
  4. Function: thin film evaporation (limited to materials commonly used in semiconductor processes)
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • EB gun Model EGL-35M * 5kw EB power
      • \r\n\t\t
    • Cryo pump U-10 pu (2300 L/SN2), minimum pressure 3.0E-7 Torr
      • \r\n\t\t
    • Substrate size: 4″, 6″
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material.
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and get the reservation number, then download the E-Gun (B) OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the E-Gun (B) OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Material cost is extra: a full load can hold 18 pieces of 4-inch wafers, or 9 pieces of 6-inch wafers.
    3. \r\n\t
  3. Payment method:\r\n\t
      \r\n\t\t
    • Self-operated: Start-up fee + material fee charged
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + foundry fee
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    5. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169091752997425152&init=Y","expFile":"Dual Electron Gun Evaporation System B"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=d03012fb-5857-45ef-bdbf-7359e9ae8e56","relateName":"Dual E-Gun Evaporation System A"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1990&serno=39b8b95d-349e-4703-8911-6d780a18ede3","relateName":"Thermal Evaporation Coater"}]},{"subject":"High vacuum coating system","detailContent":"
\r\n
\"High
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Goldton Technology KD-Cluster
    2. \r\n\t
  2. Purchase period: November 2018
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608)
    4. \r\n\t
  4. Function: multi-layer thin film sputtering, evaporation
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • High vacuum sample pick and place system. (Sample surface can be plasma cleaned)
      • \r\n\t\t
    • High vacuum sample transfer system. (Maximum 6-inch sample holder can be transferred)
      • \r\n\t\t
    • High vacuum electron beam evaporation system. (Including two sets of 6kw electron beam evaporation sources, two sets of 6kw high-voltage power supplies, and two sets of XY electron beam scanning controllers.)
      • \r\n\t\t
    • High vacuum sputtering system. (Including one DC Power 2 kw and one RF Power 1 kw.)
      • \r\n\t\t
    • Three sets of Holders can be placed at the same time, and each set of Holders can hold 6-inch, 4-inch, 3-inch, 2-inch wafers or fragment holding discs respectively.
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for Obtaining Instrument Usage Permissions\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the HVD System OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the HVD System OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Items approved by Guiyi, please make an appointment online if you have a Guiyi account, and pay in cash if you do not have a Guiyi account.
    2. \r\n\t
  2. The cost of materials is extra, and each full load can hold 6-inch, 4-inch, 3-inch or 2-inch chips, a total of 3 pieces.
    3. \r\n\t
  3. charging method\r\n\t
      \r\n\t\t
    • Self-operated: charge start-up fee + material fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + OEM fee
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. Fees are as follows\r\n\t
      \r\n\t\t
    • Planned pricing ※The current price of precious metals is set with reference to the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Planned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit
      \r\n\t\t\t\t\tbusiness
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		75011001100
      Sputter Material Fee
      \r\n\t\t\t\t\t(NTD/KA)      		Ti=140 / Ni=170 / Ta=220 / Al=85  
      E-Gun material fee
      \r\n\t\t\t\t\t(NTD/KA)      		Ge=70 / Ti=70 / Mo=60 / Ta=100 / Co=60 / W=60 / Ni=50 / Cr=70 / Si=50 / Pt=current price / Pd=current price  
      \r\n\t\t
      \r\n\t\t 
      \r\n\t\t
      • \r\n\t\t
    • Unplanned pricing ※The current price of precious metals is set with reference to the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Unplanned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit 
      \r\n\t\t\t\t\tbusiness 
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		15001100011000
      Sputter Material Fee
      \r\n\t\t\t\t\t(NTD/KA)      		Ti=280 / Ni=340 / Ta=440 / Al=170Ta=440 / Al=170    Ti=1400 / Ni=1700 / Ta=2200 / Al=850Ti=1400 / Ni=1700 / Ta=2200 / Al=850
      E-Gun
      \r\n\t\t\t\t\tmaterial fee
      \r\n\t\t\t\t\t(NTD/KA)      		Ge=140 / Ti=140 / Mo=120 / Ta=200 / Co=120 / W=120 / Ni=100 / Cr=140 / Si=100 / Pt=current price / Pd=current priceGe=700 / Ti=700 / Mo=600 / Ta=1000 / Co=600 / W=600 / Ni=500 / Cr=700 / Si=500 / Pt=current price / Pd=current priceGe=700 / Ti=700 / Mo=600 / Ta=1000 / Co=600 / W=600 / Ni=500 / Cr=700 / Si=500 / Pt=current price / Pd=current price
      \r\n\t\t
      \r\n\t\t
      • \r\n\t
    \r\n\t
    5. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169153389909512192&init=Y","expFile":"High vacuum coating system"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=9a19d78c-3f70-4649-9075-674aab7e1e0d","relateName":"Vacuum Sputtering System (B)"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=8c517baa-f69b-4fa7-b57c-a3a09b1dc6e3","relateName":"Vacuum Sputtering System (A)"}]},{"subject":"Vacuum Sputtering System (A)","detailContent":"
\r\n
\"Vacuum
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2024-02-06","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand model: British Ion Tech Microvac 450CB
    2. \r\n\t
  2. Purchase period: April 1991
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608) 
    4. \r\n\t
  4. Function: thin film sputtering
    5. \r\n\t
  5. Important Specifications\r\n\t
      \r\n\t\t
    • Three 4-inch sputtering cathodes
      • \r\n\t\t
    • POWER: DC 1500W*2 and RF: 600W*1
      • \r\n\t\t
    • Can hold 6 4-inch wafers or 3 6-inch wafers
      • \r\n\t\t
    • Gas: MFC for Ar, O2, N2
      • \r\n\t\t
    • Air extraction system: RP + Cryo Pump
      • \r\n\t\t
    • Can be coated with multi-layer film
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6.  The instrument can be used with special process material
    \r\n\t 
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
Self-operated instruments:
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Delegate to operate the instrument:
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management System(https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the Sputter OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the Sputter OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. For items approved by Guiyi, those who have a Guiyi account should make an appointment online, and those who do not have a Guiyi account should pay in cash.
    2. \r\n\t
  2. Material fee is extra:\r\n\t
      \r\n\t\t
    • The upper limit of the thickness of precious metal Pt per run is 50 nm.
      • \r\n\t\t
    • It can place 6 pieces of 4-inch or 3-inch wafers, and 3 pieces of 6-inch wafers.
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3.  Payment method:\r\n\t
      \r\n\t\t
    • Self-operation: charge start-up fee + material fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + OEM fee
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. The fees are as follows:\r\n\t
      \r\n\t\t
    • Planned pricing: ※The current price of precious metals is determined with reference to the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Planned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit
      \r\n\t\t\t\t\tbusiness
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		600900900
      Material cost
      \r\n\t\t\t\t\t(yuan/KA)      		Al=85 / Co=90 / Cr=110 / Cu=70 / Fe=70 / Mg=110 / Mo=70 / Ni=170 / Ta=220 / Ti=140 / TiW=200 / W=110 / TaSi2= 220 / W5Si=110 / Pt=current price / Pd=current price  
      \r\n\t\t
      \r\n\t\t 
      \r\n\t\t
      • \r\n\t\t
    • Unplanned pricing: ※The current price of precious metals is determined with reference to the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Unplanned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit 
      \r\n\t\t\t\t\tbusiness 
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		120090009000
      Material cost
      \r\n\t\t\t\t\t(yuan/KA)      		(School Unit): Al=170 / Co=180 / Cr=220 / Cu=140 / Fe=140 / Mg=220 / Mo=140 / Ni=340 / Ta=440 / Ti=280 / TiW=400 / W =220 / TaSi2=440 / W5Si=220 / Pt=current price / Pd=current price (research/for-profit): Al=850 / Co=900 / Cr=1100 / Cu=700 / Fe=700 / Mg= 1100 / Mo=700 / Ni=1700 / Ta=2200 / Ti=1400 / TiW=2000 / W=1100 / TaSi2=2200 / W5Si=1100 / Pt=current price / Pd=current price  
      \r\n\t\t
      \r\n\t\t
      • \r\n\t
    \r\n\t
    5. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169147367857852416&init=Y","expFile":"Vacuum Sputtering System A"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=9a19d78c-3f70-4649-9075-674aab7e1e0d","relateName":"Vacuum Sputtering System (B)"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=2f7adde1-542d-4b1a-901c-ab4adfb3fb37","relateName":"High vacuum coating system"}]},{"subject":"Vacuum Sputtering System (B)","detailContent":"
\r\n
\"Vacuum
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Nano Facility Center
\r\n
\r\nInstrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Goldton Technology Co., Ltd.
    2. \r\n\t
  2. Purchase period: April 2009
    3. \r\n\t
  3. Location: Laboratory, 3rd Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55608) 
    4. \r\n\t
  4. Function: thin film sputtering
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Man-machine interface
      • \r\n\t\t
    • Three 6-inch sputtering cathodes
      • \r\n\t\t
    • Can hold 6 pieces of WAFER (either 6 inches or 4 inches, can be allocated by yourself, a total of 6 pieces)
      • \r\n\t\t
    • POWER: DC: 2500W*2 and RF: 1000W*1
      • \r\n\t\t
    • Gas: MFC for Ar, N2 and O2
      • \r\n\t\t
    • Air extraction system: RP + Cryo Pump
      • \r\n\t\t
    • Can be coated with multi-layer film
      • \r\n\t\t
    • The speed of the substrate carrier is 0~30rpm, which can be adjusted
      • \r\n\t\t
    • Can heat up to 300°C
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Do-it-yourself regulations","page2":"
\r\n
Self-operated instruments:
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page3Title":"Delegated Operation Regulations","page3":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management System (https://vir.nstc.gov.tw/home/Index). Make an appointment and get the appointment number, then download the Sputter OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the Sputter OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page4Title":"Charges","page4":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. For items approved by Guiyi, those who have a Guiyi account should make an appointment online, and those who do not have a Guiyi account should pay in cash.
    2. \r\n\t
  2. A total of 6 4-inch or 6-inch chips can be placed.
    3. \r\n\t
  3. Fee method:\r\n\t
      \r\n\t\t
    • Self-operated: charge start-up fee + material fee
      • \r\n\t\t
    • Entrusted operation: charge start-up fee + material fee + OEM fee
      • \r\n\t
    \r\n\t
    4. \r\n\t
  4. The cost is as follows\r\n\t
      \r\n\t\t
    • Planned pricing: ※The current price of precious metals is determined based on the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Planned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit
      \r\n\t\t\t\t\tbusiness
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		600900900
      Material cost
      \r\n\t\t\t\t\t(yuan/KA)      		 Ti=140 / Ni=280 / Ta=550 / Hf=940  
      \r\n\t\t
      \r\n\t\t
      • \r\n\t\t
    • Unplanned pricing: ※The current price of precious metals is determined based on the international spot price.\r\n\t\t
      \r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\t\r\n\t\t\t\t\r\n\t\t\t\r\n\t\t
      Unplanned pricing
       school unitresearch
      \r\n\t\t\t\t\tunit      		for-profit 
      \r\n\t\t\t\t\tbusiness 
      \r\n\t\t\t\t\tunit
      OEM fee
      \r\n\t\t\t\t\t(yuan/time)          		900900900
      Start-up fee
      \r\n\t\t\t\t\t(yuan/time)      		120090009000
      Material cost
      \r\n\t\t\t\t\t(yuan/KA)      		(School units): Ti=280 / Ni=560 / Ta=1100 / Hf=1880 (Research/for-profit institutions): Ti=1400 / Ni=2800 / Ta=5500 / Hf=9400  
      \r\n\t\t
      \r\n\t\t
      • \r\n\t
    \r\n\t
    5. \r\n
\r\n
","page5Title":null,"page5":null,"page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1169119378910744576&init=Y","expFile":"Vacuum Sputtering System B"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=8c517baa-f69b-4fa7-b57c-a3a09b1dc6e3","relateName":"Vacuum Sputtering System (A)"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/view?module=corefacilities&id=1992&serno=2f7adde1-542d-4b1a-901c-ab4adfb3fb37","relateName":"High vacuum coating system"}]},{"subject":"Atomic Layer Chemical Vapor Deposition System (ALD)","detailContent":"
\r\n
\"Atomic
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-05-21","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Instrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: Veeco Fiji-G2
    2. \r\n\t
  2. Year of purchase: 2023
    3. \r\n\t
  3. Place of placement: Laboratory 122, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
    4. \r\n\t
  4. Function: deposit Al2O3, HfO2, TiN, ZrO2, TiO2 thin films
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Usable wafer size: fragmented to 8 inches
      • \r\n\t\t
    • Dual cavity: Chamber A-front-end dielectric layer film deposition, Chamber B-back-end dielectric layer and metal film deposition
      • \r\n\t\t
    • Thermal deposition and plasma-enhanced deposition can be performed
      • \r\n\t\t
    • Gas used: Ar, N2, O2, NH3, H2, CF4
      • \r\n\t
    \r\n\t
    6. \r\n\t
  6. The instrument can be used with special process material
    7. \r\n
\r\n
","page2Title":"Precautions","page2":"
\r\n
Precautions
\r\n\r\n
    \r\n\t
  1. Test pieces using Chamber A must not contain metal films or undergo post-processing, and must be RCA clean before deposition.
    2. \r\n\t
  2. Please explain in detail the material of the substrate wafer and what substances are contained on it.
    3. \r\n\t
  3. Chamber A can enter the substrate material: Si, Ge.
    4. \r\n\t
  4. Each OEM application form is limited to 3 runs or 6 hours of process time.
    \r\n\t 
    5. \r\n
\r\n
","page3Title":"Do-it-yourself regulations","page3":"
\r\n
self-operated instrument
\r\n\r\n
    \r\n\t
  1. Instructions for obtaining the permission to use the instrument:\r\n\t\r\n\t
    2. \r\n\t
  2. Instrument opening level and number of people.
    3. \r\n\t
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:\r\n\t\r\n\t
    4. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Commissioning the operation of the instrument
\r\n\r\n
    \r\n\t
  1. If there is an NSTC project, please go to the NSTC Basic Research Core Facility Reservation Service Management system (https://vir.nstc.gov.tw/home/Index). Make reservations and obtain the reservation number, then download the ALD entrusted OEM application form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    2. \r\n\t
  2. For those without an NSTC project, please download the ALD entrusted OEM application form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
    3. \r\n
\r\n
","page5Title":"Charges","page5":"
\r\n
Charge information
\r\n\r\n
    \r\n\t
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
    2. \r\n\t
  2. Parts of an hour are counted as one hour.
    3. \r\n\t
  3. For the cleaning fee, see Wet_Bench Fee Schedule.
    4. \r\n\t
  4. Payment method:\r\n\t
      \r\n\t\t
    • Self-operated: charge production fee + material fee
      • \r\n\t\t
    • Entrusted operation: charge production fee + material fee + foundry fee
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Cost inquiry link：https://vir.nstc.gov.tw/VI_SearchResult?item=1
    6. \r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1242378409917550592&init=Y","expFile":"ALD"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]},{"subject":"Vacuum Rapid Thermal Processing System (RTP)","detailContent":"
\r\n
\"Vacuum
\r\n\r\n\r\n
","dataClassName":null,"pubUnitName":"Instrumentation Resource Center ","posterDate":null,"updateDate":"2026-06-16","liaisonper":null,"liaisontel":null,"liaisonfax":null,"liaisonemail":null,"languageurl":null,"page1Title":"Instrument introduction","page1":"
\r\n
Instrument Information
\r\n\r\n
    \r\n\t
  1. Brand Model: UNITEMP RTP-200
    2. \r\n\t
  2. Year of purchase: March, 2026
    3. \r\n\t
  3. Location: Laboratory 129, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55616)
    4. \r\n\t
  4. Function:\r\n\t
      \r\n\t\t
    • The system features two processing chambers, categorized into the front-end chamber and the back-end chamber based on application
      • \r\n\t\t
    • Post-ion implantation annealing, Rapid Thermal Oxidation (RTO), Rapid Thermal Nitridation (RTN), and thin-film densification, Silicide formation and metal sintering/interface modification.
      • \r\n\t
    \r\n\t
    5. \r\n\t
  5. Important specs:\r\n\t
      \r\n\t\t
    • Sample Size: Pieces up to 8-inch wafers.
      • \r\n\t\t
    • Heating Capability: Rapid infrared lamp heating, temperature range from RT (Room Temperature) to 1100°C.
      • \r\n\t\t
    • Ramp-up Rate & Maximum Temperature Limits: Using a susceptor/carrier tray: Maximum ramp rate of 40°C/sec (RT to 800°C), max temperature 1100°C. Direct processing of an 8-inch wafer: Maximum ramp rate of 100°C/sec (RT to 1000°C), max temperature 1000°C.
      • \r\n\t\t
    • Soak/Duration Limits:
      \r\n\t\t1000°C to 1100°C: Maximum 30 seconds.
      \r\n\t\t600°C to 999°C: Maximum 120 seconds.
      \r\n\t\tBelow 600°C: Maximum 600 seconds.
      • \r\n\t\t
    • Process Gases: N2,Ar,O2,NH3, 5% H2/N2.
      • \r\n\t\t
    • Temperature Uniformity (Standard Deviation): ≦1.5%.
      • \r\n\t\t
    • Temperature Sensor: N-type Thermocouple.
      • \r\n\t\t
    • Vacuum Performance: Ultimate pressure can reach 10-3 hPa using only the dry pump. When both the dry pump and turbo molecular pump (TMP) are engaged, ultimate pressure can reach 10-6 hPa.
      • \r\n\t
    \r\n\t
    6. \r\n
\r\n
","page2Title":"Special Process Materials & Important Notes","page2":"
\r\n
Special Process Materials & Important Notes
\r\n\r\n
    \r\n\t
  1. Users must pass the qualification assessment prior to operating this equipment.
    2. \r\n\t
  2. Substrate & Material Restrictions:\r\n\t
      \r\n\t\t
    • Front-end Chamber (A): Restricted to Si, Ge, and SiC substrates.
      • \r\n\t\t
    • Front-end Chamber (B): Restricted to Si, Ge, SiC, and Sapphire substrates.
      • \r\n\t\t
    • Front-end Chamber Requirements: Samples entering the front-end chambers must not contain any metals or polymer materials, must not have undergone back-end processing, and must undergo RCA cleaning beforehand.
      • \r\n\t\t
    • General Restriction: For both front-end and back-end processes, samples must strictly contain NO Au, Ag, Cu, Fe, or polymer materials.
      • \r\n\t
    \r\n\t
    3. \r\n
\r\n
","page3Title":"Non-delegated Operation regulations","page3":"
\r\n
Non-delegated Operation
\r\n\r\n
    \r\n\t
  1. Users must already possess Wet Bench operation clearance before applying for the RTP system.
    2. \r\n\t
  2. Access Authorization Steps:\r\n\t
      \r\n\t\t
    • Daytime Access Application Procedure (Authorized hours: Monday to Friday, 8:00–17:00).
      • \r\n\t\t
    • 24-Hour Access Application Procedure (Daytime access required first).
      • \r\n\t\t
    • Important Notices (Please read carefully to safeguard your user rights).
      • \r\n\t\t
    • Vacuum RTP System Operation Guidelines & Assessment Record Form.
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Instrument access levels and user capacity limits apply.
    4. \r\n\t
  4. Once authorized, please log into the following systems to obtain a serial number and reserve time slots:\r\n\t
      \r\n\t\t
    • NSTC Research Core Facility Reservation Service Management System (To obtain a serial number).
      • \r\n\t\t
    • Nano Center Equipment Reservation System (To reserve time slots).
      • \r\n\t
    \r\n\t
    5. \r\n
\r\n
","page4Title":"Delegated Operation Regulations","page4":"
\r\n
Delegated Operation
\r\n\r\n
    \r\n\t
  1. With NSTC Project Funding: Please make a reservation via the NSTC Research Core Facility Reservation Service Management System to get a reservation number. You can download the RTP Service Request Form and submit the completed form, along with your samples, to the Nano Center staff (2F, Solid-State Electronics System Building) for scheduling.
    2. \r\n\t
  2. Without NSTC Project Funding: Download the RTP Service Request Form directly, and submit the completed form along with your samples to the Nano Center staff (2F, Solid-State Electronics System Building) for scheduling.
    3. \r\n
\r\n
","page5Title":"Service Fees","page5":"
\r\n
Service Fees
\r\n\r\n
    \r\n\t
  1. For those with an NSTC grant, fees will be calculated according to the grant-based fee schedule; for those without an NSTC grant, fees will be calculated according to the non-grant-based fee schedule.
    2. \r\n\t
  2. Billing Components:\r\n\t
      \r\n\t\t
    • Non-delegated Operation: Startup Fee + Usage Fee + Vacuum Pumping Fee.
      • \r\n\t\t
    • Delegated Operation: Startup Fee + Usage Fee + Vacuum Pumping Fee + Service Fee.
      • \r\n\t
    \r\n\t
    3. \r\n\t
  3. Table of  Service Fees:
    4. \r\n
\r\n
\r\n \r\n\r\n
\r\n
\r\n\r\n\t\r\n\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\t\r\n\t\t\r\n\t\r\n
 
Service ItemReservation with an NSTC grantReservation without an NSTC grant
Academic institutionResearch institutionIndustry
Service Fee (per run)NT$ 900NT$ 900NT$ 900NT$ 900
Startup Fee (per run)NT$ 200NT$ 200NT$ 1,000NT$ 2,000
Usage Fee (per minute)NT$ 5NT$ 10NT$ 30NT$ 50
Vacuum Pumping Fee (per run)NT$ 200NT$ 200NT$ 200NT$ 200
\r\n
\r\n
","page6Title":null,"page6":null,"page7Title":null,"page7":null,"page8Title":null,"page8":null,"docs":[],"images":[{"fileurl":"https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&detailNo=1516368350320529408&init=Y","expFile":"Vacuum Rapid Thermal Processing System (RTP)"}],"videos":[],"audios":[],"resources":[{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1990","relateName":"List of Instruments"},{"relateURL":"https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&id=1992","relateName":"Basic Service-Nanofabrication"}]}]