<MachineOpenDataModel><subject>&lt;![CDATA[III-V Molecular Beam Epitaxy System]]&gt;</subject><detailContent>&lt;![CDATA[&lt;div class="ed_model05 clearfix">&#xd;
&lt;div class="ed_pic_right">&lt;img alt="Group III or Five Molecular Beam Epitaxy System" src="/ord/en/app/machine/image?module=corefacilities&amp;amp;detailNo=1169160834551648256&amp;amp;init=N" />&lt;/div>&#xd;
&#xd;
&lt;ul>&#xd;
	&lt;li class="ed_txt">&lt;strong>III-V MOLECULAR BEAM EPITAXY SYSTEM&lt;/strong>&lt;br />&#xd;
	Brand Model: Veeco Modular GEN II solid source III-V MBE&lt;/li>&#xd;
	&lt;li class="ed_txt">&lt;strong>Instrument expert: Prof. Lin Sheng-Di&lt;/strong>&lt;br />&#xd;
	ext 31240&lt;br />&#xd;
	Email &lt;a href="mailto:mailto:sdlin@nycu.edu.tw" title="sdlin@nycu.edu.tw">sdlin@nycu.edu.tw&lt;/a>&lt;/li>&#xd;
	&lt;li class="ed_txt">&lt;strong>Instrument consulting and operation services: Ms. Wu,&amp;nbsp;Chu-Chun&lt;/strong>&lt;br />&#xd;
	Extension 54248, 55665&lt;br />&#xd;
	Email &lt;a href="mailto:isabelwu@nycu.edu.tw" title="isabelwu@nycu.edu.tw">isabelwu@nycu.edu.tw&lt;/a>&lt;/li>&#xd;
	&lt;li class="ed_txt">&lt;strong>Instrument location: Room R110, 1st Floor,&amp;nbsp;Solid-State Electronics Bldg., Guanfu Campus&lt;/strong>&lt;/li>&#xd;
&lt;/ul>&#xd;
&lt;/div>]]&gt;</detailContent><dataClassName>Nanofabrication</dataClassName><pubUnitName>Instrumentation Resource Center                                                                     </pubUnitName><posterDate/><updateDate>2025-04-28</updateDate><liaisonper/><liaisontel/><liaisonfax/><liaisonemail/><languageurl/><page1Title>Instrument introduction</page1Title><page1>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Instrument Information&lt;/strong>&lt;br />&#xd;
Chinese name: Group III and V Molecular Beam Epitaxy System&lt;br />&#xd;
English name: III-V Molecular Beam Epitaxy System&lt;br />&#xd;
English abbreviation: MBE&lt;br />&#xd;
Label: Veeco Modular GEN II solid source III-V MBE&lt;br />&#xd;
Instrument Location: Room R110, 1st Floor,&amp;nbsp;Solid-State Electronics Bldg., Guanfu Campus&lt;br />&#xd;
Purchase Date: August 2004&lt;br />&#xd;
Date of joining Guiyi: January 2015&lt;br />&#xd;
&lt;br />&#xd;
&lt;strong>Important Specifications&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">High Vacuum Growth chamber: Pressure &amp;lt; 5&amp;times;10-10 torr&lt;/li>&#xd;
	&lt;li class="ed_txt">Source Material: Ga, Al, In, As, Sb.&lt;/li>&#xd;
	&lt;li class="ed_txt">Doping Source: Be, Si, Te&lt;/li>&#xd;
	&lt;li class="ed_txt">Max substrate Size: 3 inches&lt;/li>&#xd;
	&lt;li class="ed_txt">Epitaxy Layer thickness Variation &amp;lt; 5%&lt;/li>&#xd;
	&lt;li class="ed_txt">The highest growth temperature: 640℃&lt;/li>&#xd;
	&lt;li class="ed_txt">In-situ rsidual gas analysis (RGA) and reflection high energy electron diffraction (RHEED, 15kV):&lt;/li>&#xd;
	&lt;li class="ed_txt">Regular monitoring epitaxy layer growth rate and quality.&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page1><page2Title>Service Items and System Open Level</page2Title><page2>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>service items&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">This system is an ultra-high vacuum system. In principle, it is not open to operate by itself, but it can be accompanied on site.&lt;/li>&#xd;
	&lt;li class="ed_txt">This system serves each wafer with 6 hours as a unit.&lt;/li>&#xd;
	&lt;li class="ed_txt">The applicant user must contact the professor or technician in charge of the instrument to confirm that the sample meets the requirements.&lt;/li>&#xd;
	&lt;li class="ed_txt">A maximum of 5 samples can be reserved per person at a time.&lt;/li>&#xd;
	&lt;li class="ed_txt">Cancellation must be notified one week in advance.&lt;/li>&#xd;
&lt;/ol>&#xd;
&#xd;
&lt;div class="ed_txt">&lt;br />&#xd;
&lt;strong>System open level&lt;/strong>&lt;br />&#xd;
At present, only the entrusted service is open, and it is operated by the technicians of this laboratory.&lt;/div>&#xd;
&lt;/div></page2><page3Title>Charges</page3Title><page3>&lt;div class="ed_model06 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Opening hours:&lt;/strong>This machine adopts entrusted reservation. If you need to make an appointment, please go to your instrument system to make an appointment.&lt;/div>&#xd;
&#xd;
&lt;div class="table01">&#xd;
&lt;table class="ed_table caption-top" summary="Charges">&#xd;
	&lt;caption>Charges&lt;/caption>&#xd;
	&lt;tbody>&#xd;
		&lt;tr>&#xd;
			&lt;th style="text-align: left;">service items&lt;/th>&#xd;
			&lt;th style="text-align: left;">Charging standard (unit: NTD)&lt;/th>&#xd;
		&lt;/tr>&#xd;
		&lt;tr>&#xd;
			&lt;td data-th="service items">Arsenic sample commission&lt;/td>&#xd;
			&lt;td data-th="Charging standard (unit: NTD)">Planning appointment: $4,000 /1&amp;micro;m&lt;br />&#xd;
			Unplanned appointment: $15,000 /1&amp;micro;m&lt;/td>&#xd;
		&lt;/tr>&#xd;
		&lt;tr>&#xd;
			&lt;td data-th="service items">Antimonide sample commission&lt;/td>&#xd;
			&lt;td data-th="Charging standard (unit: NTD)">Planning appointment: $5,000 /1&amp;micro;m&lt;br />&#xd;
			Unplanned appointment: $25,000 /1&amp;micro;m&lt;/td>&#xd;
		&lt;/tr>&#xd;
		&lt;tr>&#xd;
			&lt;td data-th="service items">Special Structure Testing Fee&lt;/td>&#xd;
			&lt;td data-th="Charging standard (unit: NTD)">Additional correction fees ranging from 2-6&amp;micro;m will be charged according to the structural difficulty&lt;/td>&#xd;
		&lt;/tr>&#xd;
		&lt;tr>&#xd;
			&lt;td data-th="service items">Substrate cost&lt;/td>&#xd;
			&lt;td data-th="Charging standard (unit: NTD)">GaAs series: $7,000 / single chip&lt;br />&#xd;
			GaSb series: $25,000/single chip&lt;br />&#xd;
			InP series: $9,000 / single chip&lt;/td>&#xd;
		&lt;/tr>&#xd;
	&lt;/tbody>&#xd;
&lt;/table>&#xd;
&lt;/div>&#xd;
&lt;/div>&#xd;
&#xd;
&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;br />&#xd;
&amp;nbsp; &amp;nbsp;&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">The charging standard is calculated based on the sample growth thickness of 1 micron. The part exceeding 1 micron or more, if it is less than 1 micron, it will be calculated as 1 micron.&lt;/li>&#xd;
	&lt;li class="ed_txt">In order to maintain the stability of the system and ultra-high vacuum conditions, the request of the entruster to provide substrates is not accepted; the unit will provide the crystal growth substrates uniformly.&lt;/li>&#xd;
	&lt;li class="ed_txt">If you have other special requirements, please mail or call to discuss.&lt;/li>&#xd;
	&lt;li class="ed_txt">For those who need long-term entrusted services, long-term project discounts can be provided.&lt;/li>&#xd;
	&lt;li class="ed_txt">The unit can also assist in evaluating the feasibility of the structure and consulting services for growth proposals.&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page3><page4Title>Test film restrictions and reservation method</page4Title><page4>&lt;div class="ed_model01 clearfix">&#xd;
&lt;div class="ed_txt">&lt;strong>Management methods and test strip restrictions&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">The substrates that can be grown are GaAs, InP, InAs, GaSb, and InSb.&lt;/li>&#xd;
	&lt;li class="ed_txt">After submitting the appointment form, the entrusted operator must contact the technician to determine the experimental time and growth content.&lt;/li>&#xd;
&lt;/ol>&#xd;
&#xd;
&lt;div class="ed_txt">&lt;br />&#xd;
&lt;strong>Instrument reservation method&lt;/strong>&lt;/div>&#xd;
&#xd;
&lt;ol>&#xd;
	&lt;li class="ed_txt">&lt;a href="https://vir.nstc.gov.tw/home/Index" title="Instrument reservation">Instrument reservation&lt;/a>&lt;/li>&#xd;
	&lt;li class="ed_txt">If you want to cancel the appointment, please contact the technician one week before and cancel online.&lt;/li>&#xd;
	&lt;li class="ed_txt">Submit the appointment application form, please take a photo or scan it and send it to the technician&amp;#39;s mailbox&lt;/li>&#xd;
&lt;/ol>&#xd;
&lt;/div></page4><page5Title/><page5/><page6Title/><page6/><page7Title/><page7/><page8Title/><page8/><docs/><images><images><fileurl>https://www.nycu.edu.tw/ord/en/app/machine/image?module=corefacilities&amp;detailNo=1169160834551648256&amp;init=Y</fileurl><expFile>Group III or Five Molecular Beam Epitaxy System</expFile></images></images><videos/><audios/><resources><resources><relateURL>https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&amp;id=1990</relateURL><relateName>List of Instruments</relateName></resources><resources><relateURL>https://ord.nycu.edu.tw/ord/en/app/machine/list?module=corefacilities&amp;id=1992</relateURL><relateName>Basic Service-Nanofabrication</relateName></resources></resources></MachineOpenDataModel>