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List of Instruments

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  • Nanofabrication

  • Update Date：2024-06-12
  • Units：Instrumentation Resource Center
Dielectric Materials Reactive Ion Etching System B
REACTIVE ION ETCHING SYSTEM FOR DIELECTRIC MATERIALS B
Link to Nano Center Introduction Page

Instrument Information
  1. Brand model: RIE200L made by SamCo, Japan
  2. Purchase period: December 1, 2002
  3. Place of placement:Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666)
  4. Function: etching silicon dioxide, silicon nitride and other materials
  5. Important Specifications: The RF generator can output a maximum of 300W and a frequency of 13.56MHz. The etching system can enter CF4, O2, SF6, CHF3 and other gases to etch materials such as silicon dioxide and silicon nitride.
  6. The instrument can be used with special process material.
Precautions
  1. Please explain in detail what substances are contained on the substrate (such as SiO2, Si3N4, Metal, photoresist, etc.).
  2. If there are no special requirements for etching, it will be done according to the central standard process:
    • SiOx : (RIE mode) 300 ~400 Å/min 100W,4Pa.
    • SiNx : (RIE mode) 900~1000 Å/min 100W,4Pa.
  3. The wafer shall not contain Ag, Au, Cu, Fe, Ni, Zn, LiNbO3, In, Pb, Sn, ITO and other components.
  4. Metal must not be exposed.
self-operated instrument
  1. Instructions for obtaining the permission to use the instrument:
  2. Instrument opening level and number of people.
  3. After you have the permission to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
Commissioning the operation of the instrument
  1. If there is a National Academy of Sciences, please come firstNational Science Council Basic Research Core Facility Reservation Service Management SystemMake an appointment and get the appointment number, then download RIE 200L OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
  2. For those without a national science account, please download directly RIE 200L OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
Charge information
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
  2. charging method
    • Do it yourself: charge a fee
    • Entrusted operation: charging usage fee + OEM fee
  3. Cost inquiry link
List of Instruments Basic Service-Nanofabrication Dielectric Active Ion Etching System A
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