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List of Instruments

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  • Nanofabrication

  • Update Date：2024-06-12
  • Units：Instrumentation Resource Center
Si Deep-RIE
Silicon Deep Etch System
  • Si Deep-RIE
    Brand Model: Oxford Estrelas 100
  • Instrument expert: Prof. Chen, Kuan-Neng
    ext 31558
  • Equipment management personnel: Mr. Hu, Jack
    Extension 55607, 55666
    Email jackhu@nycu.edu.tw
  • Equipment management personnel: Mr. Lee, James
    Extension 55660, 55666
    Email cwlee@nycu.edu.tw
  • Instrument location: Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus
    ext 55666
Link to Nano Center Introduction Page

Instrument Information
  1. Brand Model:Oxford Estrelas 100
  2. Purchase period: December 2016
  3. Place of placement:Laboratory 116, 1st Floor, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55666)
  4. Function: dry etching, mainly silicon deep etching (Bosch Process)
  5. Important specifications: The gas used includes C4F8, SF6, CHF3, CF4, Ar, O2, cooled by He gas system, mainly 4″ wafer
  6. The instrument can be used with special process material
Precautions
  1. Please specify the material of the substrate wafer, what kind of substances (such as SiO2, photoresist, etc.) are contained on it, and whether to remove the photoresist after etching (an additional Wet Bench application form is required).
  2. Silicon deep etching sample preparation please follow Test piece regulations.
self-operated instrument
  1. Instructions for obtaining the permission to use the instrument:
  2. Instrument opening level and number of people.
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
Commissioning the operation of the instrument
  1. If there is a National Academy of Sciences, please come first National Science Council Basic Research Core Facility Reservation ServiceManage system reservations and get the reservation number, then download Si Deep-RIE OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
  2. For those without a national science account, please download directly Si Deep-RIE OEM Application Form, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
Charge information
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
  2. Payment method:
    • Do it yourself: charge a fee
    • Entrusted operation: charging usage fee + OEM fee
  3. Cost inquiry link
List of Instruments Basic Service-Nanofabrication Shallow Si RIE High Density Plasma Active Ion Etching System
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