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List of Instruments

exchangealt 中文

  • Nanofabrication

  • Update Date：2024-06-12
  • Units：Instrumentation Resource Center
Pattern Generator
Graphics Generation System
  • PATTERN GENERATOR
    Brand Model: Raith VOYAGER
  • Instrument expert: Prof. Li Pei-Wen
    ext 54210
  • Instrument consulting and operation services: Mr. Tsai, Ching-Hsiang
    Extension 55605, 55616
    Email ch-tsai@nycu.edu.tw
  • Instrument location: Room 118, Solid State Electronic Systems Building, Guanfu Campus
Link to Nano Center Introduction Page

Instrument Information
  1. Brand Model: Raith VOYAGER
  2. Purchase period: 2019
  3. Place of placement: Room 118, Solid State Electronic Systems Building, Guanfu Campus (TEL: 55667)
  4. Function: thin film photoresist exposure and writing
  5. Important specs:
    • Exposure source: Electron Beam
    • Maximum beam energy: 50kV
    • Maximum write field: 500μm
    • 50MHz Pattern Generator
  6. The instrument can be used with special process material
     
Precautions
  1. Positive list: the surface of the test piece is flat (thickness less than 1mm) (such as Si, SiC, GaAs, GaN and other materials)
  2. Negative table columns (prohibited):
    • Magnetic materials, powder materials, piezoelectric materials, synthetic photoresist
    • low melting point material
    • All materials that decompose or release gases and hinder the maintenance of vacuum when exposed to electron beams
self-operated instrument
  1. Instructions for obtaining the permission to use the instrument:
    1. Daytime permission application process description (Using permission is Monday to Friday 8:00~17:00)
    2. 24-hour application process description (You need to have daytime permission to apply)
    3. Precautions (Be sure to read carefully, so as not to lose your own rights)
    4. Graphics Generation System Operating Specifications & Exam record sheet
  2. Instrument opening level and number of people, the relevant notes are as follows:
    1. In principle, the same laboratory is open to 3 people to operate by themselves, not limited to master and doctoral students (but doctoral students are preferred).
    2. Applicants who apply for self-operation of this equipment need to have experience in using nanocenter SEM instruments (the cumulative operating hours are at least 20 hours). knot book.
    3. 20 hours of accumulated hours of SEM operation must be attached.
    4. The number of training times for this equipment to operate by itself is 5 times.
    5. Those who are the trainers of this equipment must first obtain the 24-hour self-operating authority of this equipment.
    6. After passing the assessment, if the device has not been used for more than 3 months, its operating authority will be cancelled.
  3. After you have the right to use the instrument, you need to log in to the following system to obtain the serial number and make an appointment for use:
    1. National Science Council Basic Research Core Facility Reservation Service Management System (get serial number)
    2. Nano Center Instrument Reservation System (Use time slot reservation)
Commissioning the operation of the instrument
  1. If there is a National Academy of Sciences, please come first National Science Council Basic Research Core Facility Reservation Service Management System Make an appointment and get the appointment number, then download OEM Application Form for Graphical Generation System, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
  2. For those without a national science account, please download directly OEM Application Form for Graphical Generation System, and send the completed application form and materials to the center (2F, Solid State Electronic System Building of the school) to assist the instrument management personnel in scheduling OEM.
Charge information
  1. Those with an accountant from the National Science Council will be priced according to the plan payment standard, and those without an accountant from the National Science Council will be priced according to the non-plan payment standard.
  2. The chip is prepared by the user.
  3. When NFC photoresist is required for the entrusted graphic exposure and writing, the entrusted coating material fee: 800 yuan (within 2 pieces of fragments or 1 piece of 4 inches, cash charge).
  4. The exposure and writing of the mask depends on the pattern and will be quoted separately after evaluation.
  5. Payment method:
    • Self-operation: charge usage fee
    • Entrusted operation: charge usage fee + OEM fee
  6. Cost inquiry link
List of Instruments Basic Service-Nanofabrication Laser Pattern Generator
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